Optical Emission Spectroscopy During the Deposition Process of SiO2 Using Tetraethyl Orthosilicate/N2O Plasma Enhanced Chemical Vapor Deposition.
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ژورنال
عنوان ژورنال: SHINKU
سال: 1995
ISSN: 0559-8516,1880-9413
DOI: 10.3131/jvsj.38.455